X-ray photoelectron spectroscopy (XPS), or electron spectroscopy for chemical analysis (ESCA), is a material characterisation technique that provides elemental and chemical information for solid sample with the analysing depth in few atomic layers. XPS is an instrument in surface science for thin films, coatings and native oxide layers study. Wide range of materials like metals, semiconductors, ceramics, polymers and composite materials, regardless of electrical conductivity, can be analysed. A brief outline about an XPS process include X-ray irradiation, photoelectron excitement and kinetic energy detection of the emitted electron. Characteristic energies of the excited photoelectrons from different electron shells of elements are located at different energy positions as peaks along the XPS spectrum, with which the chemical composition and the chemical state of the individual element can be determined. The precision of an analysing area is in micron, depends on the size of the adjustable focused X-ray beam.

This XPS is within the infrastructure of Chalmers Materials Analysis Laboratory (CMAL) and is hosted by the Department of Industrial and Materials Science. Together with the traditional spectrometric and depth profiling functions, large and small area X-ray mapping and angle-resolving analysis are the two other features for fine features imaging and non-destructive ultra-thin films analyses.

Should you seek help, training, or further information, please contact Associate Professor Emmy Yu Cao (Tel.: 031-772-1252; Email: yu.cao@chalmers.se), or Dr. Eric P.L. Tam (Tel: 031-772-1253; Email: eric.tam@chalmers.se) at the Department of Industrial and Material Science.